Dear AMBER users ,
I am new to AMBER though I was going through Advanced Amber tutorial Tutorial 1 using dye and linker.
I want to make same type of residues to be protected by NMe (for C terminal) or ACE(N terminal). pls clarify the following:
1) can I use GAFF for these residues to be used later and making prmtop file.
2) I cannot use other than HF/631-G* method to optimise. the charges
that I will use, during RESP fit, for NMe and ACE (as given in
tutorial) are actually derived by optimising amino acids by HF/631-G*
method also.
but for GAFF parameters have been derived by using MP2/631-G (will this
effect the charges so derived by HF method during simulation). this is
confusion pls clarify it whether I can use GAFF or not or I have
misunderstood the things
thanks in advance
JIomm
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Received on Mon Jul 13 2009 - 18:09:28 PDT
